Evidence for electron-induced X-ray emission in sputtering deposition = Evidence d'une émission de rayons X induits par électrons pendant le dépôt par pulvérisationHECQ, M.Applied physics letters. 1986, Vol 49, Num 8, pp 445-446, issn 0003-6951Article

A GLOW DISCHARGE MASS SPECTROMETRY STUDY OF REACTIVE SPUTTERING = ETUDE PAR SPECTROMETRIE DE MASSE A DECHARGE LUMINESCENTE DE LA PULVERISATION REACTIVEHECQ M; HECQ A.1981; THIN SOLID FILMS; ISSN 0040-6090; CHE; DA. 1981; VOL. 76; NO 1; PP. 35-43; BIBL. 29 REF.Article

A PRACTICAL APPROACH TO QUANTITATIVE ANALYSIS FOR OXYGEN WITH AN ELECTRON MICROPROBE.HECQ M; LABART C.1977; ANAL. CHIM. ACTA; PAYS BAS; DA. 1977; VOL. 94; NO 2; PP. 471-473; BIBL. 4 REF.Article

ON THE STUDY OF SPUTTERED C-PT COMPOUNDS AND THEIR BEHAVIOUR IN THE CO OXIDATION REACTIONHECQ A; ROBERT T; HECQ M et al.1981; J. LESS-COMMON MET.; CHE; DA. 1981-08; VOL. 80; NO 2; PP. P83-P89; BIBL. 21 REF.Article

ETUDE EXPERIMENTALE DE LA PULVERISATION CATHODIQUE REACTIVE DU COBALT.HECQ M; HECQ A; VAN CAKENBERGHE J et al.1977; THIN SOLID FILMS; NETHERL.; DA. 1977; VOL. 42; NO 1; PP. 97-105; ABS. ANGL.; BIBL. 10 REF.Article

DEPOT DE COUCHES MINCES D'OXYDES PAR EVAPORATION SOUS IMPACT IONIQUE DANS UNE DECHARGE INDUITE.HECQ M; VAN CAKENBERGHE J; GORINAS G et al.1976; THIN SOLID FILMS; NETHERL.; DA. 1976; VOL. 33; NO 1; PP. 65-87; ABS. ANGL.; BIBL. 34 REF.Article

DETERMINATION OF AU-O BOND ENERGY BY GLOW DISCHARGE MASS SPECTROMETRYHECQ A; VANDY M; HECQ M et al.1980; J. CHEM. PHYS.; ISSN 0021-9606; USA; DA. 1980; VOL. 72; NO 4; PP. 2876-2878; BIBL. 7 REF.Article

SOME EXPERIMENTAL ASPECTS OF DC REACTIVE SPUTTERINGHECQ M; HECQ A; LIEMANS M et al.1978; J. APPL. PHYS.; USA; DA. 1978; VOL. 49; NO 12; PP. 6176-6178; BIBL. 15 REF.Article

SPUTTERING DEPOSITION, XPS AND X-RAY DIFFRACTION CHARACTERIZATION OF OXYGEN-PLATINUM COMPOUNDSHECQ M; HECQ A; DELRUE JP et al.1979; J. LESS-COMMON. METALS; NLD; DA. 1979; VOL. 64; NO 2; PP. P25-P37; BIBL. 45 REF.Article

Spectrometry of X-ray induced emission in sputtering deposition: a new technique for in situ thin-film chemical analysisHECQ, M; LELEUX, J.Analytical chemistry (Washington, DC). 1987, Vol 59, Num 3, pp 440-443, issn 0003-2700Article

Metal clusters in plasma polymerized matrices: goldKAY, E; HECQ, M.Journal of applied physics. 1984, Vol 55, Num 2, pp 370-374, issn 0021-8979Article

SPUTTERING DEPOSITION, XPS AND X-RAY DIFFRACTION CHARACTERIZATION OF HARD NITROGEN-PLATINUM THIN FILMSHECQ A; DELRUE JP; HECQ M et al.1981; J. MATER. SCI.; ISSN 0022-2461; GBR; DA. 1981; VOL. 16; NO 2; PP. 407-412; BIBL. 21 REF.Article

On the migration of defects and impurities in microelectromechanical systems subject to a large number of light pulsesWAUTELET, M; DAUCHOT, J. P; HECQ, M et al.Applied physics. A, Materials science & processing (Print). 2001, Vol 73, Num 4, pp 425-427, issn 0947-8396Article

ON THE STUDY OF SPUTTERED C-PT COMPOUNDS AND THEIR BEHAVIOUR IN THE CO OXIDATION REACTIONHECQ A; ROBERT T; HECQ M et al.1981; J. LESS-COMMON MET.; ISSN 0022-5088; CHE; DA. 1981; VOL. 80; NO 2; PP. P83-P89; BIBL. 21 REF.Article

Study of the optical properties of A1N/ZrN/A1N low-e coatingDEL RE, M; GOUTTEBARON, R; DAUCHOT, J. P et al.Surface & coatings technology. 2004, Vol 180-81, pp 488-495, issn 0257-8972, 8 p.Conference Paper

Analyse XPS de films minces de titane deposés par pulverisation cathodique magnétron sur SnO₂ = XPS study of magnetron cathodic sputtering deposited titanium thin films on SnO2GODFROID, T; GOUTTEBARON, R; SNYDERS, R et al.Le Vide (1995). 2002, Vol 57, Num 304, issn 1266-0167, 241, 369-375 [8 p.]Article

Synthesis and characterisation of c-BN film by triode sputteringMORTET, V; DJOUADI, M. A; LAMBERTIN, M et al.Le Vide (1995). 2000, Vol 55, Num 297, pp 283-285, issn 1266-0167Conference Paper

Contrôle in situ de l'épaisseur et des propriétés optiques de films transparents par spectrométrie optique = In situ control of thickness and optical properties of transparent films using optical spectrometryPERRY, F; PIGEAT, P; BILLARD, A et al.Le Vide (1995). 2000, Vol 55, Num 297, pp 286-290, issn 1266-0167Conference Paper

Simulation particulaire d'une décharge à cathode magnétron excitée en radio-fréquences = Particle simulation of RF excited magnetron cathod dischargeMINEA, T. M; BRETAGNE, J; GOUSSET, G et al.Le Vide (1995). 2000, Vol 55, Num 297, pp 276-278, issn 1266-0167Conference Paper

Monitoring of the aluminum nitride sputtering deposition by soft x-ray emission spectroscopyLEGRAND, P. B; DAUCHOT, J. P; HECQ, M et al.Journal of vacuum science and technology. A. Vacuum, surfaces, and films. 1992, Vol 10, Num 4, pp 945-949, issn 0734-2101, 1Conference Paper

Preparation and characterization of gasochromic thin filmsVITRY, V; RENAUX, F; GOUTTEBARON, R et al.Thin solid films. 2006, Vol 502, Num 1-2, pp 265-269, issn 0040-6090, 5 p.Conference Paper

Polymer coating of steel by a combination of electrografting and atom-transfer radical polymerizationCLAES, M; VOCCIA, S; JEROME, R et al.Macromolecules. 2003, Vol 36, Num 16, pp 5926-5933, issn 0024-9297, 8 p.Article

Atomic nitrogen source for reactive magnetron sputteringGODFROID, Th; DAUCHOT, J. P; HECQ, M et al.Surface & coatings technology. 2003, Vol 174-75, pp 1276-1281, issn 0257-8972, 6 p.Conference Paper

RF amplified magnetron source for efficient titanium nitride depositionKONSTANTINIDIS, S; NOUVELLON, C; DAUCHOT, J.-P et al.Surface & coatings technology. 2003, Vol 174-75, pp 100-106, issn 0257-8972, 7 p.Conference Paper

Characterization of triode sputtered chromium nitride coatings for wood machining applicationNOUVEAU, C; DJOUADI, M. A; LAMBERTIN, M et al.Le Vide (1995). 2000, Vol 55, Num 297, pp 279-282, issn 1266-0167Conference Paper